Chinese semiconductor company Shanghai Sinyang announced on March 8 that it has received an ASML-1400 lithography to be used for 193nm ArF dry photoresist product development.
Shanghai Sinyang had said in December last year that the ASML-1400 would arrive in China by the end of 2020.
However, the machine did not arrive on time due to difficulties encountered between Shanghai Sinyang and SMIC Beijing's 12-inch fab, SMNC, in discussing the shipping and installation details of the equipment.
The two companies subsequently signed an agreement stating that the lithography would arrive at SMNC by the end of March 2021.
The lithography entered SMNC's factories on Monday for installation and commissioning, Shanghai Sinyang said.
Photoresists have high technological barriers, long R&D cycles, and take a long time to put into industrialization, and are expensive, Shanghai Sinyang said, adding that the depreciation and subsequent maintenance costs of the photoresist will affect the company's performance.
ASML says SMIC purchase orders relate to existing agreement for DUV lithography
(ASML 1460K. Source: ASML website)
